Multi Thin Film Coating System

PVD Products manufactures sputtering systems for depositing metal and dielectric thin films on substrates up to 300 mm in diameter.  An array of magnetron sputtering sources, using RF, DC or pulsed DC power, are operated singly or in co-deposition mode, to produce a wide variety of film compositions. Our Titan magnetron sputtering sources range in size from 1 inch (25 mm) to 8 inches (200 mm) in diameter with options such as in-situ tilt for fine adjustments of the deposition profile. Substrate stages for wafers up to 300 mm in diameter are available with heating to 850°C and RF bias.  The sputtering chamber may be fitted with additional ports for diagnostic tools such as a Residual Gas Analysis (RGA), Reflection high-energy electron diffraction (RHEED), or ellipsometry

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