Spin Coating

Spin coating has been used for several decades for the application of thin films. Spin coating is a procedure involves dispensing a liquid accurately onto a substrate, then spinning to achieve desired thickness of the film of nanometer to micrometer range on a substrate.
Final film thickness andother properties will depend on the nature of the resin (viscosity, drying rate, percent solids, surface tension, etc.) and the parameters chosen for the spin process. Factors such as final rotational speed, acceleration contribute to how the properties of coated films are defined.
Our spin coaters are compact with advanced features. their maximum rotational speed is 10,000 RPM. they can be programmed in 9 stages. their minimum rise time to reach the defined speed is 1 second. The speed is controlled very accurately during the spinning. they have user friendly software that can be used to control the spinning process by a computer or their processor.
We proclaim that this low cost instrument is one of the most sophisticated and user friendly spin coaters.

SC-403Power supply: 110 – 240 V – 50/60 Hz Size: 24 cm × 23 cm × 27 cm Weight: 4 Kg Rotational speed: 50 – 3000 RPM Rise Time: 1 – 59 sec Stage time: 3 sec – 59 min Accuracy : less than 5% across the full range Vacuum Suction: as per requirement Maximum substrate diameter: 4 Inches User-friendly Window based software Process protocols can be set and stored

SC-406

Power supply: 110 – 240 V – 50/60 Hz
Size: 24 cm × 23 cm × 27 cm
Weight: 4 Kg
Rotational speed: 50 – 6000 RPM
Rise Time: 1 – 59 sec
Stage time: 3 sec – 59 min
Accuracy : less than 5% across the full range
Vacuum Suction: as per requirement
Maximum substrate diameter: 4 Inches
User-friendly Window based software
Process protocols can be set and stored

SCL-410

Power supply: 110 – 240 V – 50/60 Hz Size: 24 cm × 23 cm × 27 cm Weight: 4 Kg Rotational speed: 50 – 10000 RPM Rise Time: 1 – 59 sec Stage time: 3 sec – 59 min Accuracy : less than 5% across the full range Vacuum Suction: as per requirement Maximum substrate diameter: 4 Inches User-friendly Window based software Process protocols can be set and stored

Field of Application

 Photo resist coating
Organic light emitting diodes
Organic field effect transistors
Synthetic Polymers
Biopolymer
Nanotechnology researches

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